Amorphous Silicon and Silicon-Germanium Thin Film Solar Cell by Plasma Enhanced Chemical Vapor Deposition
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 100 === In this study, application of high-frequency plasma enhanced chemical vapor deposition to characterize a-Si and a-SiGe:H thin film solar cells. The paper consists of two parts: the first part discusses characteristics of the intrinsic layer, n-layer and tan...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/hyaa64 |