Study of Etching Rate for Single Crystal Silicon and Quartz
碩士 === 國立臺灣大學 === 應用力學研究所 === 100 === The purpose of this thesis is to study the etching behavior of single crystal silicon (110) and quartz (z-cut). By using micro-electronic mechanical system frabrication, we can create specific pattern on the wafer surface. According to the two dimensional etch t...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/21685396161651553906 |