The Studies of Process Optimization and Effective Work Function Tuning on Nano Scale High-k/Metal Gate PMOSFETs
博士 === 國立清華大學 === 材料科學工程學系 === 100 === To sustain CMOS transistor continuously scaling, high-k and metal gate technology has become the foundation of logic CMOS technology. Because of the direct tunneling effect, a high gate leakage will be induced in the conventional Poly/SiON gate with a very th...
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| Format: | Others |
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2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/56037237181982454836 |