Fabrication of plasmonic crystal using two beam interference lithography
碩士 === 國立東華大學 === 光電工程學系 === 100 === In this paper, we mainly based on the traditional double-beam interference lithography to produce plasmonic crystals. According to the interference principle, we construct a maskless lithography setup based on laser interference. By Controlling the dual-beam...
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ndltd-TW-100NDHU56140102018-05-06T04:19:03Z http://ndltd.ncl.edu.tw/handle/gxf3gx Fabrication of plasmonic crystal using two beam interference lithography 以雙光束干涉微影術製備電漿子晶體 Li-Cheng Huang 黃立丞 碩士 國立東華大學 光電工程學系 100 In this paper, we mainly based on the traditional double-beam interference lithography to produce plasmonic crystals. According to the interference principle, we construct a maskless lithography setup based on laser interference. By Controlling the dual-beam interference angle, we can control the period of the structure. By tuning the fabrication parameters during the lithography processes, one can make fine photoresist structure on the silicon substrate. Based on the preliminary testing parameters, the exposure time, develop time and so on, a second exposure technique is applied to construct a two-dimensional periodic plasmonic structure. The photoresist pattern is transferred onto the Si substrate using ICP-RIE dry etching. After covering the Si structure by Au film with 20nm thickness using thermal evaporation method, the 2D plasmonic crystal can be made. The optical properties of the plasmonic crystals are measured using angle-resolved Fourier transform Infrared (FTIR) spectrometer. According to the angle resolved reflection spectrum, it is shown that the plasmonic crystals present the phenomenon of slow light in the near infrared (NIR) spectral range at specific incident angle. The of slow light phenomenon is arisen from that the light is coupled to surface plasmon (SP) and the SP is horizontally localized. As a consequence, the grating coupled SP converts to localized SP. Therefore, the group speed of light is slower than that in vacuum. This phenomenon can be used in light-harvesting or storage of light. Chih-Ming Wang 王智明 2012 學位論文 ; thesis 41 |
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碩士 === 國立東華大學 === 光電工程學系 === 100 === In this paper, we mainly based on the traditional double-beam interference lithography to produce plasmonic crystals. According to the interference principle, we construct a maskless lithography setup based on laser interference. By Controlling the dual-beam interference angle, we can control the period of the structure. By tuning the fabrication parameters during the lithography processes, one can make fine photoresist structure on the silicon substrate. Based on the preliminary testing parameters, the exposure time, develop time and so on, a second exposure technique is applied to construct a two-dimensional periodic plasmonic structure.
The photoresist pattern is transferred onto the Si substrate using ICP-RIE dry etching. After covering the Si structure by Au film with 20nm thickness using thermal evaporation method, the 2D plasmonic crystal can be made. The optical properties of the plasmonic crystals are measured using angle-resolved Fourier transform Infrared (FTIR) spectrometer. According to the angle resolved reflection spectrum, it is shown that the plasmonic crystals present the phenomenon of slow light in the near infrared (NIR) spectral range at specific incident angle. The of slow light phenomenon is arisen from that the light is coupled to surface plasmon (SP) and the SP is horizontally localized. As a consequence, the grating coupled SP converts to localized SP. Therefore, the group speed of light is slower than that in vacuum. This phenomenon can be used in light-harvesting or storage of light.
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Chih-Ming Wang |
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Chih-Ming Wang Li-Cheng Huang 黃立丞 |
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Li-Cheng Huang 黃立丞 |
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Li-Cheng Huang 黃立丞 Fabrication of plasmonic crystal using two beam interference lithography |
author_sort |
Li-Cheng Huang |
title |
Fabrication of plasmonic crystal using two beam interference lithography |
title_short |
Fabrication of plasmonic crystal using two beam interference lithography |
title_full |
Fabrication of plasmonic crystal using two beam interference lithography |
title_fullStr |
Fabrication of plasmonic crystal using two beam interference lithography |
title_full_unstemmed |
Fabrication of plasmonic crystal using two beam interference lithography |
title_sort |
fabrication of plasmonic crystal using two beam interference lithography |
publishDate |
2012 |
url |
http://ndltd.ncl.edu.tw/handle/gxf3gx |
work_keys_str_mv |
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1718635007509004288 |