Fabrication of plasmonic crystal using two beam interference lithography

碩士 === 國立東華大學 === 光電工程學系 === 100 === In this paper, we mainly based on the traditional double-beam interference lithography to produce plasmonic crystals. According to the interference principle, we construct a maskless lithography setup based on laser interference. By Controlling the dual-beam...

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Bibliographic Details
Main Authors: Li-Cheng Huang, 黃立丞
Other Authors: Chih-Ming Wang
Format: Others
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/gxf3gx