The optical emission spectroscopic study of silicon thin film deposited by TE mode Electron Cyclotron Resonance Chemical Vapor Deposition
碩士 === 國立中央大學 === 能源工程研究所 === 100 === This study utilized Optical Emission Spectroscopy (OES) to diagnose the plasma spectrum by electron cyclotron resonance chemical vapor deposition (ECR-CVD) and tried to find out the relationship with the deposition properties. Under varying process setting , cha...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/27793648198078695434 |