Gap filling capability improvement via magnetic field simulation assisted on long throw sputtering PVD of magnet designs and arrangements
碩士 === 國立中央大學 === 能源工程研究所 === 100 === This study used Finite Volume Method to simulate the magnetic profile of PVD (physical vapor deposition) chamber.. From this study, it can be applied to different kinds of target designs. The side magnets consist of a total of 44 sets for one supporter around th...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/70220570733516585032 |