Wet etching process and properties of single-crystalline silicon nanowires

碩士 === 國立中央大學 === 化學工程與材料工程研究所 === 100 === In the present study, we have demonstrated that large-area, length-tunable arrays of vertically aligned Si nanowire were successfully produced on (001)Si and (111)Si substrates by using the PS nanosphere lithography combined with the Au-assisted selective c...

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Bibliographic Details
Main Authors: Yu-Yuan Lin, 林毓源
Other Authors: Shao-liang Cheng
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/03790517969831107366