Inverse Mask and Source Synthesis for Resolution Enhancement in Optical Lithography
博士 === 國立交通大學 === 光電工程學系 === 100 === As CMOS manufacturing processes push towards the 20 nm node, many resolution enhancement techniques (RET) have been proposed and sometimes applied with varying degrees of success. These include the optical proximity correction (OPC), the immersion lithography, do...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/60599739818159805480 |