Growth and physical properties of group III-nitrides on Si substrates

博士 === 國立交通大學 === 電子物理系所 === 100 === In this dissertation, the growth of GaN nano-rods, InN nano-rods, In-polar and N-polar InN films on Si(111) substrate by molecular beam epitaxy (MBE) were studied. The x-ray diffraction (XRD), photoluminescence (PL) and Raman scattering were used to investigate t...

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Bibliographic Details
Main Author: 辜瑞泰
Other Authors: 周武清
Format: Others
Language:en_US
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/72611374548505916389