EDA and Testing Methodologies for Characterization and Minimization of Process Variation on Advanced CMOS Technology Nodes
博士 === 國立交通大學 === 電子研究所 === 100 === As process technologies continually advance, process variation has greatly increased and gradually become one of the most critical factors for IC manufacturing. Based on design-for-manufacturability considerations, EDA methodologies such as dummy fill and boolean...
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| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/84348982104624183395 |