A Study on Carbon Doping Technology and High-Performance Poly-Si Nanowire TFTs
博士 === 國立交通大學 === 電子研究所 === 100 === In this dissertation, we studied the impact of the carbon (C) doping technology on the thermal stability of nickel monosilicide (NiSi) and the Ni-silicide-contacted n+/p junction. Moreover, using the low-temperature C ion implantation (I/I) technique followed...
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| Format: | Others |
| Language: | en_US |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/45850168179356052469 |