Accurate Process-Hotspot Dectection using Critical Design Rule Extraction
碩士 === 國立交通大學 === 電子研究所 === 100 === As technology for lithography beyond 65nm, the IC industry faces challenge in reliability. Many resolution enhancement technologies (RETs) have been developed to improve yield and reliability. For these patterns which are susceptible to lithography process, if d...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/50922197953391804470 |