Improving GaN-based LED performance by plasma treated wet-etched pattern-sapphire-substrates
碩士 === 國立交通大學 === 材料科學與工程學系 === 100 === In choosing the way to fabricate patterned sapphire substrate ( PSS ), standard photolithography and wet-etching are preferred process is because of their lower cost, higher throughput than dry-etching process. However, several facets ( sidewalls ) on PSS form...
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| Format: | Others |
| Language: | zh-TW |
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2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/60701071358721574585 |