Reflectance Improvement of Mo/Si Multilayer Mirrors and Masks for Extreme Ultra-Violet Lithography
碩士 === 國立交通大學 === 加速器光源科技與應用碩士學位學程 === 100 === In this study, the design and characteristics of Mo/Si multilayers for extreme ultra-violet (EUV) lithography have been investigated. The reflectance of the quarter-wavelength multilayers can be enhanced further by optimized procedures with which the la...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/77100946056740022341 |