Study of Etching Process of HARC(High Aspect Ratio Contact) Holes for 63nm DRAM Applications

碩士 === 國立暨南國際大學 === 光電科技碩士學位學程在職專班 === 100 === Semiconductor industry is a new technique industry. Recent years, it develops very soon in Taiwan, just as project of the Moore’s Law, the element size is continuing scaled down. Therefore, today the Integrated Circuit process technique becomes very...

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Bibliographic Details
Main Authors: Chen, JuChun, 陳儒俊
Other Authors: 林佑昇
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/79355448840293140637