The Effects of Interlayer and different dopant substrates on the Thermal Stability of Nickel Silicides
碩士 === 國立成功大學 === 電機工程學系碩博士班 === 100 === Abstract Compared with TiSi2 and CoSi2, NiSi has lower Si consumption, and just need one- step annealing. But NiSi has poor thermal stability and tends to form NiSi2 phase which has higher resistance. To improve and investigate the problem of poor thermal sta...
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| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/73849126764141050525 |