Synthesis and Characteristics of Carbon-doped Silicon Oxide Low-k Dielectric Constant Materials
博士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 100 === The objective of this study is to investigate a suitable low dielectric material (low-k)and copper (Cu)electrochemical mechanical planarization (ECMP) mechanism for the application of the nanometer integrated circuits. The main focus of this dissertation c...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/95957482931989024896 |