Investigation of nano-structured TaN metal gate thin films using reactive sputtering
碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 100 === In this research, TaN is used as a metal gate due to its excellent conductivity, thermal stability, and tunable work function. A reactive magnetron sputtering system is used to deposit TaN thin films with various deposition parameters, such as the working...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/95485425931436446257 |