Subband Structures and Transport Properties of Strained Si1-xGex Alloy Channel MOSFET

博士 === 國立中興大學 === 物理學系所 === 100 === Valence subband properties and hole effective masses of MOS inversion layer in strained Si1-xGex alloys channel on (001), (110), and (111) Si substrates are studied theoretically based on the Luttinger-Kohn Hamiltonian. The subband structures under investigation a...

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Bibliographic Details
Main Authors: Jun-Wei Fan, 樊君偉
Other Authors: 林中一
Format: Others
Language:en_US
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/07565002612827423594