Stress Analysis and Carrier Mobility Calculation of InGaAs MOSFETs

碩士 === 國立中興大學 === 光電工程研究所 === 100 ===   III-V materials will be the potential candidates to replace Si in the future CMOS technology. Recently, the strained InGaAs n-MOSFET with S/D Stressors was demonstrated for the first time. In this thesis, we will study the performance of strained InGaAs MOSF...

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Bibliographic Details
Main Authors: Hsiang Ou-Yang, 歐陽湘
Other Authors: 張書通
Format: Others
Language:en_US
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/64188341269041010788