Study on the Processing and properties of TiAlBN coatings by Unbalanced Magnetron Sputtering

• Main Authors: Chia-Hang Tsai, 蔡嘉航
• Other Authors: Wei-Yu Ho
• Format: Others
• Language: zh-TW
• Published: 2012
• Online Access: http://ndltd.ncl.edu.tw/handle/89280704228611747573

碩士 === 明道大學 === 材料科學與工程學系碩士班 === 100 === This thesis is to study the process and properties of the TiAlBN multilayer by using the unbalanced magnetron sputtering system. The content of this study is focused on the microstructure, mechanical properties and its potential application. Two different sputtering systems, home-made and Leybold 600SP were compared with TiAlBN coatings. The process were divided into three sessions, including the synthesis of TiAlB multilayer coatings, which were conducted with the variation of AlB2 magnetron power of 300W, 400W, 500W. The second session is the process with introduction of N2 gas, which leads to TiAlBN multilayer coatings. The third session is carried out by following the second session with extra introduction of C2H2 gas on top formed as TiAlBCN coatings. The Al33B67 and Ti circular targets were face to face installed in the chamber. Microstructures of the studied coatings were examined by XRD for the crystal preferred orientation, SEM for surface morphology and the fractured sections, ESCA for element binding configuration, and AFM. The mechanical properties was investigated by using Rockwell indentation to determine the adhesion, nanoindenter testing for the hardness, the wear test of grinding tungsten steel balls and glass balls. The results show that with increasing magnetron power density contributes to the increase of film thickness. TiAlB and TiAlBN exhibits the low Ra value. Introduction of N2 and C2H2 gases, respectively, leads to the decrease of film hardness, but improve the tribological behaviors.