A Study on Microstructure and Abrasive Resistance of Ti-Si-N Hard Films by Reactive Sputtering

碩士 === 國立高雄應用科技大學 === 模具工程系 === 100 === This research is to deposite TiSiN film on ASP2030 tool steel using magnetron-reactive sputtering. The TiSiN films with different ratio of Ti/Si are deposited under controlling the Ti/Si ratio of targets and input watt with the fixed gas flow and working press...

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Bibliographic Details
Main Authors: SHAO-YU HSIEH, 謝少宇
Other Authors: Shi-Yung Chiou
Format: Others
Language:zh-TW
Online Access:http://ndltd.ncl.edu.tw/handle/44835703086899783682