Fabrication and Characteristics Analysis of theK0.5Na0.5NbO3-based Ferroelectric Thin Films by theRF Sputtering Process
碩士 === 南台科技大學 === 電子工程系 === 99 === In this study, by the use of solid-state reaction, different contents of Li2CO3 and Ta2O5 are doped and substituted into the K0.5Na0.5NbO3-based ceramic to form K0.5Na0.5(Nb0.95Ta0.05)O3 and 0.97K0.5Na0.5NbO3-0.03LiNbO3 targets, respectively. And by the RF sputteri...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/18934793279867826595 |