使用資料挖掘技術建置大尺寸高階光罩之關鍵尺寸斜線修正系統
碩士 === 僑光科技大學 === 資訊科技研究所 === 99 === In plain terms of mask manufacture procedure, it starts by applying photoresist onto quartz blanks which then will be drawn various geometry by using the devices of laser or electron beam. After the developing process, the exposed photoresist on the blanks will b...
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/80588837058485220470 |