Development of Laser Direct Writing Equipment of Nano Stage

碩士 === 國立虎尾科技大學 === 機械與機電工程研究所 === 99 === This research project in title of “Laser Direct Writing Processing Equipment for Periodic Nanostructure Pattern” integrated the technologies of the hybrid long-stroke precision nano-stage design, the multi-DOF heterodyne interferometer feedback control syste...

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Bibliographic Details
Main Authors: Yu-Siang Wang, 王昱翔
Other Authors: 覺文郁
Format: Others
Language:zh-TW
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/46755r
Description
Summary:碩士 === 國立虎尾科技大學 === 機械與機電工程研究所 === 99 === This research project in title of “Laser Direct Writing Processing Equipment for Periodic Nanostructure Pattern” integrated the technologies of the hybrid long-stroke precision nano-stage design, the multi-DOF heterodyne interferometer feedback control system, and the novel laser direct writing lithography instrument. The hybrid long-stroke multi-axis precision nano-stage formed by an H-type long-stroke nano-stage and a nano piezo-stage. The multi-DOF heterodyne interferometer feedback control system uses dual-frequency laser interferometer for the measurement of X and Y axis position and θz angle error of the nano-stage. The ovel laser direct writing lithography instrument includes blue laser direct writing head, FPGA interface and servo control main board. Finally, the system integration and relevant tests have been completed as well. This equipment have been working to generate increase writing speed, precision and range. In this research, the integration of the Laser Direct Writing Processing Equipment can improve the process speed, precision and range, overcome the optical limit of interference to reduce the writing spot, generate arbitrary patterns, and cut down the equipment cost.