Development of Blue Ray Laser Direct-Write Lithography System
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 99 === In this investigation an optical exposure apparatus have constituted by lithography and laser-direct technique with positioning stage. By blue-ray DVD pickup head for system light source which wavelength is 405nm and numerical aperture of focus lens is 0.85,...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/nj9hjk |
| Summary: | 碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 99 === In this investigation an optical exposure apparatus have constituted by lithography and laser-direct technique with positioning stage. By blue-ray DVD pickup head for system light source which wavelength is 405nm and numerical aperture of focus lens is 0.85, therefore the size of light spot for red-ray DVD can be reduced to 19％.
The structure of this research is applying the photo diode integrated circuit in DVD pickup head and using voice coil motor to focus on the action of lock. The focus error signal reflected by the PDIC receiving the substrate which can use for testing location. And the way in auto focus controlled by programmable automation can shorten the time of system process and reduce the personal errors. With pattern substrate on Queensgate Instrument NPS-XY-100A nanopositioning stage to control the program which can bring in complicated pattern path. So it can manufacture nanostructure or micro electrodes. This research developed a blue ray laser direct write lithography system. The size of spot is 1.64 μm and time of laser control which can be 450 ns. The system can be applied in semiconductor construction and design.
|
|---|