Development of Blue Ray Laser Direct-Write Lithography System
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 99 === In this investigation an optical exposure apparatus have constituted by lithography and laser-direct technique with positioning stage. By blue-ray DVD pickup head for system light source which wavelength is 405nm and numerical aperture of focus lens is 0.85,...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/nj9hjk |