Characterization of MgZnO thin films deposited by reactive dual ion beam sputter deposition
碩士 === 國立臺灣科技大學 === 電子工程系 === 99 === MgxZn1-xO thin films with x = 0 ~ 0.46 has been deposited on Si (100), glass and quartz substrates by reactive dual ion beam sputtering deposition. XRD analysis shows that as x increases, a-axis lattice constant increases while the grain size decreases. As x re...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/enuwqf |