Nanometer-Scale Standard Cell Library for Enhanced Redundant Via1 Insertion Rate
碩士 === 國立臺灣科技大學 === 電子工程系 === 99 === Despite the rapid advances in process technology, via failure is still problematic in nanometer-scale semiconductor manufacturing. Adding redundant vias is the typical approach for improving yield and reliability. Standard cells are essential for increasing the i...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | en_US |
Published: |
2010
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Online Access: | http://ndltd.ncl.edu.tw/handle/n9jrej |