Nanometer-Scale Standard Cell Library for Enhanced Redundant Via1 Insertion Rate

碩士 === 國立臺灣科技大學 === 電子工程系 === 99 === Despite the rapid advances in process technology, via failure is still problematic in nanometer-scale semiconductor manufacturing. Adding redundant vias is the typical approach for improving yield and reliability. Standard cells are essential for increasing the i...

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Bibliographic Details
Main Authors: Shih-Hsien Yang, 楊士賢
Other Authors: Shanq-Jang Ruan
Format: Others
Language:en_US
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/n9jrej