High-Speed Algorithms for Scatterometry Diagnosis and GPU-based Optical Lithography Simulation
碩士 === 國立臺灣大學 === 電子工程學研究所 === 99 === To ensure the quality of the nano-imprint fabricated optical gratings, optical scatterometry (OS) is an efficient and effective mean to diagnose the actual fabricated geometry. To facilitate the diagnosis process, efficient pattern matching algorithms over a hug...
Main Authors: | Meng-chun Chiu, 邱盟竣 |
---|---|
Other Authors: | Chung-Ping Chen |
Format: | Others |
Language: | en_US |
Published: |
2010
|
Online Access: | http://ndltd.ncl.edu.tw/handle/61313048320264765595 |
Similar Items
-
Nanoscale limits of angular optical scatterometry
by: Ruichao Zhu, et al.
Published: (2020-01-01) -
Gpu Based Lithography Simulation and Opc
by: Subramany, Lokesh
Published: (2011) -
On-Board Wind Scatterometry
by: Xingou Xu, et al.
Published: (2020-04-01) -
Perspective: Optical measurement of feature dimensions and shapes by scatterometry
by: Alain C. Diebold, et al.
Published: (2018-05-01) -
Advances in Optical and Magnetooptical Scatterometry of Periodically Ordered Nanostructured Arrays
by: Martin Veis, et al.
Published: (2013-01-01)