Fabrication of Silicon Molds for Nanoimprint Lithography by Integrating of Laser Interferometric photolithography & Reactive Ion Etch Lithography
碩士 === 國立清華大學 === 動力機械工程學系 === 99 === The main focus of this thesis is to integrate the laser interference lithography (LIL) process for our systems with reactive ions etch (RIE) to fabricate silicon molds. We cannot just pattern photoresist on silicon and then etch. Reflections from the silicon sur...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/71742426008558382232 |