Fabrication and Characterizations of Copper Oxide Thin Films by DC Reactive Magnetron Sputtering
碩士 === 國立中山大學 === 光電工程學系研究所 === 99 === Abstract In this study, copper oxide thin films prepared by DC reactive magnetron sputtering using a Cu target were studied. By changing the oxygen partial pressure ratios and sputtering power and deposition temperatures during sputtering, we obtained copper...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/73959931060069360228 |