Epitaxial growth and annealing effect on the structural, optical and electrical properties of ZnO thin films grown by atomic layer deposition

碩士 === 國立新竹教育大學 === 應用科學系碩士班 === 99 === Non-polar (1000) ZnO epitaxial thin films have been prepared on (101 ̅0) m-plane sapphire by using atomic layer deposition (ALD) method , the comparison results of conventional (non-stock mode) and flow-rate interruption method (FRI or stock mode) showed the t...

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Bibliographic Details
Main Author: 曾安邦
Other Authors: Chih-Ming Lin
Format: Others
Language:zh-TW
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/40457349653331021250