VLSI Design of High-Performance Process-Variation Resilient DCT

碩士 === 國立東華大學 === 電機工程學系 === 99 === As process geometries shrink, process variation issues have become increasingly important. The negative bias temperature instability effects (NBTI) have also become accordingly more and more serious. This has resulted in changes in transistor threshold voltage...

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Bibliographic Details
Main Authors: Jen-Chieh Tsai, 蔡仁傑
Other Authors: Hsin-Chou Chi
Format: Others
Language:zh-TW
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/32626979495744570993