The optical properties and interface stresses of the sputtered dielectric thin films
博士 === 國立中央大學 === 光電科學研究所 === 99 === A novel method is proposed to reduce the residual stress of multilayers without altering their optical constants. The residual stress of SiNx thin films deposited by RF ion-beam sputtering exceeds 1.5GPa. For example, the residual stress of single SiN1.06 layer d...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/74187667101871453919 |