Utilization of plasma etching technique for studing the fabrication of nanometer scale based photoresist lines
碩士 === 國立交通大學 === 工學院碩士在職專班半導體材料與製程設備組 === 99 === The Moore's Law is the main driving force to push the semiconductor industry toward the minimal linewidth sacle during the past decade. The state-of-the-art technology for the large scale production in foundry industry is 45 nm, while 32 nm for...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/99311442123099979143 |