Pattern morphology on patterned sapphire substrate and its effect on the GaN epitaxial growth
碩士 === 國立交通大學 === 工學院碩士在職專班半導體材料與製程設備組 === 99 === The purpose of this study is to investigate the effect of pattern morphology on the patterned sapphire substrate (PSS) for GaN epitaxial growth. Two-step wet etching technique was used to fabricate PSS. Pitch 3µm pyramidal-like patterns of convex a...
Main Authors: | Hsiao, Feng Ching, 蕭豐慶 |
---|---|
Other Authors: | Wu, Yew Chung Sermon |
Format: | Others |
Language: | zh-TW |
Published: |
2010
|
Online Access: | http://ndltd.ncl.edu.tw/handle/44409671978757543504 |
Similar Items
-
Effect of pattern dimension and morphology of the sapphire substrate on GaN epitaxial growth
by: Wei-Che Chiu, et al.
Published: (2008) -
Growth of thick GaN films on sapphire and pattern sapphire substrates by hydride vapor phase epitaxy
by: Chien-Te Chiang, et al.
Published: (2014) -
Effects of patterned sapphire substrates on orientation relationship of GaN and Improvement of epitaxy GaN quality
by: Chang, Sheng-Chieh, et al.
Published: (2016) -
Improvement of Epitaxy GaN Quality Using Nano-Patterned Sapphire Substrates and Grown Semipolar GaN Epilayer on a-Plane Patterned Sapphire Substrates
by: Hsieh, ChengYu, et al.
Published: (2012) -
Growth of GaN thin films on Pattern Sapphire substrates by Hydride vapor phase epitaxy
by: Wen Hui HSiang, et al.
Published: (2014)