The Study of Tuning Work Function with Multi-Layer Metal Stacks for Deep Nano High-K/Metal Gate CMOSFET Applications

The Study of Tuning Work Function with Multi-Layer Metal Stacks for Deep Nano High-K/Metal Gate CMOSFET Applications

碩士 === 國立成功大學 === 電機工程學系專班 === 99

Bibliographic Details
Main Authors:	Che-HuaHsu, 許哲華
Other Authors:	Yean-Kuen Fang
Format:	Others
Language:	zh-TW
Published:	2011
Online Access:	http://ndltd.ncl.edu.tw/handle/29910206696182861198

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