Deposition and Characteristics of TiN, TiNxOy, and N-doped TiO2 Thin Films by Sputtering Using Air as a Reactive Gas
博士 === 國立中興大學 === 材料科學與工程學系所 === 99 === This study focuses on the preparation and characterization of TiN, TiNxOy, and N-doped TiO2 thin films by reactive sputtering using air as a reactive gas. The films exhibiting many superior physical and chemical properties are of technologically important mate...
Main Authors: | Mu-Hsuan Chan, 詹慕萱 |
---|---|
Other Authors: | Fu-Hsing Lu |
Format: | Others |
Language: | en_US |
Published: |
2011
|
Online Access: | http://ndltd.ncl.edu.tw/handle/90543980118747531501 |
Similar Items
-
Study on Properties of The TiNxOy Thin Films
by: Shih-Ping Lin, et al.
Published: (2006) -
Optical Properties and Microstructure of TiNxOy and TiN Thin Films before and after Annealing at Different Conditions
by: Hanan A. Abd El-Fattah, et al.
Published: (2019-01-01) -
Processing and Evaluation of TiNxOy Thin Films Prepared by Sputtering Using Air as a Reactive Gas
by: Po-Cheng Tsai, et al.
Published: (2016) -
Synthesis and Characterization of Nano-crystalline TiNxOy Thin Films by Unbalanced Magnetron Sputtering System (UBMS)
by: Shao-Hsien Chiu, et al.
Published: (2006) -
Caracterização de multicamadas TiO2/TiNxOy por técnicas de difração de raios-X
by: Chiaramonte, Thalita
Published: (2003)