Deposition and Characteristics of TiN, TiNxOy, and N-doped TiO2 Thin Films by Sputtering Using Air as a Reactive Gas

博士 === 國立中興大學 === 材料科學與工程學系所 === 99 === This study focuses on the preparation and characterization of TiN, TiNxOy, and N-doped TiO2 thin films by reactive sputtering using air as a reactive gas. The films exhibiting many superior physical and chemical properties are of technologically important mate...

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Bibliographic Details
Main Authors: Mu-Hsuan Chan, 詹慕萱
Other Authors: Fu-Hsing Lu
Format: Others
Language:en_US
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/90543980118747531501