Studies on the Optimization of the Deposition Process of SiOx Film by Atmospheric Pressure Plasma
碩士 === 龍華科技大學 === 工程技術研究所 === 99 === This thesis will present the deposition process of SiOx film by the atmospheric pressure RF plasma using organic silicon source Tetraethoxysilane (TEOS) as silica films deposited precursor. The effects of the process parameters, such as power, oxygen flow rate, c...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/88675830944596535587 |