Study on Fabrication and Measurement of Ta-Si-N Microbolometers
碩士 === 國立高雄應用科技大學 === 光電與通訊研究所 === 99 === In this papaer, the Ta-Si-N thin film was used as sensing layer of microbolometers. The effect of RTA annealing on electrical properties and stress of Ta-Si-N film was investigated. Ta-Si-N thin films were fabricated by using co-sputtering. Sheet resistance...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/81834555611636084637 |