Rule-Based Optical Proximity Correction Using Dynamic Lithography Analysis
碩士 === 中原大學 === 資訊工程研究所 === 99 === As a result of the manufacturing process continuous improvement, the feature size of IC had been smaller than the wavelength of the mainstream lithography. The smallest feature size is limited according to current lithographic techniques and manufacturing equipment...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/21130082633342492685 |