Growth behavior and field emission characteristics of the diamond films synthesized by microwave plasma enhanced chemical vapor deposition method
博士 === 淡江大學 === 物理學系博士班 === 98 === The modification on microstructure of diamond films due to the incorporation of H2 species into the Ar/CH4 ((CH4/Ar/ H2=1/99-X/X)) plasma was systematically investigated. How the characteristics of plasma modified the microstructure and the electron field emission...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/12099211506102814470 |