Improving Overlay Accuracy Performance of Electron-Beam 2nd Writing for Advanced Photomasks
碩士 === 國立臺北科技大學 === 材料及資源工程系研究所 === 98 === Development of 45 nm node reticles has been completed at most mask shops. The development of next generation 32 nm node and beyond reticles is currently underway. Electron-beam multi-writing can provide higher precision alignment than traditional laser tool...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/wh4dp9 |