Development of Process Window Analysis System for Nano-scale Lithography
碩士 === 南台科技大學 === 電子工程系 === 98 === In Semiconductor Processing, effective control of the variation of critical dimension (CD) is very important. As manufacturing technology advances, devices size are made much smaller , making the error in the manufacturing process caused the line width variation mo...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52213616974218752187 |