Characteristics of ZnO thin films grown on silicon substrate using metalorganic chemical vapor depositionmethod
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 98 === In this study, ZnO thin films were grown on silicon substrate by metalorganic chemical vapor deposition method. Effect of deposition pressure (1torr、50torr、100torr、150torr、200torr) and temperature (450、500、600、650°C) on ZnO films characteristics were studied...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/7t9gn2 |