Heat transfer modeling of excimer laser melting of amorphous silicon thin film

碩士 === 國立聯合大學 === 材料科學工程學系碩士班 === 98 === The excimer laser crystallization of amorphous silicon films is a commonly technique for fabricating poly-crystalline thin film transistors in low temperature. The grain growth in films is controlled by solidification time and melted depth during excimer...

Full description

Bibliographic Details
Main Authors: Chih-Hung Hsieh, 謝志宏
Other Authors: Hui-Chuan Lin
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/36884041498756471929