DC Sputtering Homo- and Hetero-Epitaxy of Si and Ge Films

博士 === 國立臺灣科技大學 === 電子工程系 === 98 === Homo- and hetero-epitaxy of Si and Ge films were realized by using DC magnetron sputtering in this article. Si and Ge films have been homo- and hetero-epitaxially grown on Si substrates, and the Ge films also can be homoepitaxially grown on Ge substrates. The inf...

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Bibliographic Details
Main Authors: Hsiang-en Huang, 黃祥恩
Other Authors: Wen-chang Yeh
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/85534111717012966330